Designed with the latest in technology and materials, the EON R Pants are the perfect choice for those who want the best in tactical pants.
With a 6.5 oz. Rip-stop fabric, 50% nylon / 50% cotton fade resistant, self-adjusting waist, internal ventilation system, cargo pockets with additional pockets inside, can conceal a water bottle or rifle magazine, and reinforced seat and knees, these pants are perfect for any situation.
The EON R Pants have a wide range of features that make them ideal for any situation. Whether you're on a mission or just heading to the range, these pants will have you covered.
- The latest technology in design and materials applied to tactical pants.
- US Made 6.5 oz. (185 grams.) NyCo MIL-DTL-44436B, Class 11 (Original Pattern) rip-stop Cordura® fabric.
- 50% nylon/50% cotton fade resistant fabric.
- Easy-Fit™ self-adjusting waist.
- Internal ventilation system.
- Cargo pockets with additional pockets inside.
- Reinforced seat and knees.
- Cargo pockets that can conceal a water bottle or rifle magazine.
- Knife or flash light pocket with access to the cargo pockets.
- Six 1”x 3” belt loops.
- Stretch back rise for comfort and adjustment.
- 10 fully functional pockets.
- U.S. made YKK® zippers.
- Fully adjustable pant with waist, leg opening and length adjusters for maximum comfort.
- Flexible length adjusting system.
- Zip-fly with original Velcro® closure.
- Double layer seat.
MultiCam® patterns take advantage of the way the human eye and brain perceive shape, volume, and color. Since only a very small portion of the human eye perceives color, the brain does the "filling" for the eye. MultiCam®'s unique high-resolution design takes advantage of this principle and helps the viewer "see" the pattern as part of the background.
The MultiCam® family of patterns relies more on a blending effect than a traditional contrasting effect to disguise the wearer.
This effect allows them to perform well in a wide range of environmental conditions. It also helps maintain pattern effectiveness even at close intervals where low resolution patterns often stand out against the natural environment.
U.S. PATENT PENDING NO.29669087
